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COMEC 2019 >
Please use this identifier to cite or link to this item:
http://hdl.handle.net/123456789/2442
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| Title: | APPLICATIONS OF PHOTOLITHOGRAPHY FOR THE MANUFACTURE OF SOLID MEMS BODIES |
| Authors: | Mitu, G.L.
Bejinaru Mihoc, AL. |
| Keywords: | Photolithography
MEMS
silicon wafer
photosensitive layer |
| Issue Date: | 21-Nov-2019 |
| Publisher: | TRANSILVANIA UNIVERSITY PRESS OF BRAȘOV |
| Citation: | http://scholar.google.ro/ |
| Series/Report no.: | COMEC 2019 VOL.I;65-68 |
| Abstract: | Photolithography has a significant role in the mass production of MEMS microcomponents. It is used in the preparation of the wafer substrate for the subsequent steps of making a MEMS / NEMS. For this purpose a photosensitive layer is applied on the surface of the silicon wafer. The process takes place in successive stages. Through photolithography a wide variety of structural geometries can be achieved. |
| URI: | http://hdl.handle.net/123456789/2442 |
| ISSN: | 2457-8541 |
| Appears in Collections: | COMEC 2019
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